Controlled Environments Magazine® E-Newsletter
Contamination Control for Life Sciences and Microelectronics
February 18, 2009 | Volume 3, Issue 7

Insights into Polymer Film Instability Could Aid High Tech Industries
While exploring the properties of polymer formation, a team of scientists at the National Institute for Standards and Technology (NIST) has made a fundamental discovery about these materials that could improve methods of creating the stable crystalline films that are widely used in electronics applications — and also offer insight into a range of other phenomena.
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CLEANROOM TIP OF THE WEEK
Preventing Cross-Contamination
Our company currently operates ISO Class 7 and 8 non-sterile cleanrooms and a sterile ISO Class 5 cleanroom that are interconnected by unclassified corridors. We currently don disposable coveralls over street clothes prior to entering and working in the ISO Class 7 and 8 cleanrooms. What improvements can we make to increase our level of contamination control? What can we do to prevent cross-contamination between the two cleanroom areas?
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MANAGEMENT TIP OF THE WEEK
A Practical Guide for Developing Leaders
Here's a practical guide for developing leaders, adapted from June Delano with Monitor Executive Development.

While the guide does not include everything a leader needs to learn, it does offer ideas for developing people before and during new leadership assignments. And of course, every company is different, so you'd need to adapt the list to fit your company's organizational structure.
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PRODUCT FOCUS
TexChlor™ AL Bleach Wiper
The Sterile TexChlor™ AL (TX3269) is a point-of-use, pre-wetted non-corrosive “bleach” wiper that uses a dry chemical and DI water to produce a “bleach” solution for cleaning controlled environments. The package consists of three compartments - one containing DI water, one containing a dry chemical, and the third containing cleanroom wipers. (ITW Texwipe)
INDUSTRY NEWS
IN THE MAGAZINE

Cover of Controlled Environments MagazineDry Ice Blast Cleaning
Dry ice blasting can be used to clean equipment while the equipment is hot and assembled, thereby eliminating prolonged production shutdown times.
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INDUSTRY CALENDAR
March 17-19, 2009
INTERPHEX 2009
New York, NY

March 17-19, 2009
SEMICON China
Shanghai, China

March 19-20, 2009
Enhancing Your Cleanroom Operations for Managers, Operators, Maintenance Personnel
Utica, NY

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