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IMS Nanofabrication Teams with JEOL

Thu, 09/12/2013 - 3:39pm

IMS Nanofabrication AG has formed a partnership with JEOL Ltd. for the realization of Alpha and Beta electron multi-beam mask writer (MBMW) tools for the 10nm half-pitch mask technology node. For this purpose, IMS Nanofabrication has developed and demonstrated a multi-beam write engine providing 262-thousand programmable beams of 50keV energy. JEOL provides a platform with an air-bearing vacuum stage for writing most advanced patterns on 6-in. mask blanks. The MBMW Alpha tool will be realized in 2014, and will form the basis for two consecutive MBMW Beta tools which will be built for the MBMW Collaboration formed by IMS with DNP, Intel, Photronics, and TSMC.

“We are very pleased with this partnership, as it will ensure timely completion of the Alpha and Beta tools, paving the way towards the production of HVM tools”, says Elmar Platzgummer, CEO of IMS Nanofabrication.

“This partnership reinforces JEOL’s position in the leading-edge mask writer market with a highly competitive technology. JEOL is proud to contribute a newly developed multi-generational platform with an air-bearing stage as a vital part of the tool”, sysd Yasutoshi Nakagawa, Corporate Officer, General Manager of SE Business Unit, JEOL Ltd.

IMS Nanofabrication is an Austrian based high-tech company that was founded through the merger of the former IMS Nanofabrication GmbH and IMS – Ionen Mikrofabrikations Systeme GmbH. IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications.

JEOL Ltd. provides electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes, instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs, and ESRs.

Release Date: September 3, 2013
Source: IMS Nanofabrication 

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