Equipment
Ultra Pure Water Immersion Lithography: Purification Needs and Solutions
By Michael Clouse, Annie Xia, Bipin Parekh
Optical lithography has enabled semiconductor manufacturers to increase chip capacity at astounding rates by shrinking circuit line widths. Printing of these finer lines has been achieved using a progressively smaller wavelength light source, which currently isa 193-nm laser targeted to the 65-nm features. To extend the 193-nm illumination to 45-nm and perhaps beyond, the industry will switch to immersion lithography using ultra-pure water (UPW) which is placed between the final lens and the wafer.
Water: Perfect Solvent? Or Poor Solvent?
By John B. Durkee, Ph.D., P.E.
Critical cleaning in biological and pharmaceutical industries depends upona critical characteristic of water.
Development of Fouling Resistant Water Treatment Membranes With Microbial Sensing Capabilities
By Cyndee Gruden, Ph.D., Maria Coleman, Ph.D., Isabel Escobar, Ph.D.
The modern era of membrane technologies for water purification was launched in the late 1950s with the development of asymmetric cellulose acetate (CA) membranes for reverse osmosis (RO).
Pb Detection Using ICP-MS
By Sam Richardson, Zoe Grosser,, Robert Thomas
This article describes how breakthroughs in atomic spectroscopy, and in particular ICP-MS, have led researchers to a better understanding of environmental pollution and the effects of trace metals on humans.
Pure Water: A Drop by Drop Process For Selection of Your System
By Dennis M. Connelly, CIPE
While purity requirements are paramount, another critical selection criterion is the quantity.
Contamination Control For Ultra-Pure Water For The Emerging Applications in Immersion Lithography
By Michael E. Clarke, Annie Xia, Bipin Parekh, Joseph Smith
Optical lithography is a key technology to improving resolution.
Selection Criteria for WFI Production Equipment
By Marita A. King
There are several methods for producing water-for-injection (WFI). This article provides an overview of the key features of each technology and important issues for consideration.
Laboratory Water Systems - An Overview
By Paul Nesdore
Q&A with Randy Mcleod, Senior Vice President of New Technology at Pall Corporation about the considerations for supplying water of various levels of purity for laboratories needs.
Point of Use Purification of Ultra Pure Water: Reduce Water Level Metal Contamination for Next Generation Semiconductors
By Tracy Boswell, Bipin Parekh, Joel Barnett
Ultrapure water is a critical fluid in the front end of line (FEOL) wet cleaning process. The ultra pure water (UPW) used for dilute chemical blending and post chemistry rinse must meet stringent requirements to control yield-diminishing contaminants on the wafer surface.
Life Sciences: Continuous Effluent Decontamination
By David Karle
The decontamination of liquid hazardous infectious waste streams in research and production laboratories has taken a leap forward in safety and efficacy with the introduction of new technology.